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19
Won-Jae Lee, Ho-Gi Kim, and Soon-Gil Yoon
"Microstructure Dependence of Electrical Properties of (Ba0.5Sr0.5)TiO3 Thin Films Deposited on Pt/SiO2/Si"
J. of Applied Physics, 80(10) (1996) 5891-5894.
20
Nam-Kyeong Kim, Soon-Gil Yoon, Won-Jae Lee, and Ho-Gi Kim
"Electrical Properties of SrF2 Phase on Electrical Properties SrTiO3 Thin Films by Plasma -Enhanced Metalorganic Chemical Vapo Deposition"
Integrated Ferroelectrics, Vol. 14, 1997, 105-113
21
Woong-Chul Shin and Soon-Gil Yoon
"Effect of Annealing Conditions on the Microstructure of RuO2 Thin Films Deposited by Metalorganic Chemical Vapor Deposition"
Integrated Ferroelectrics, Vol. 18, (1997) 171-182.
22
Sank-Shik Park, Cheol-Hoon Yang, and Soon-Gil Yoon
"Electrical Properties of SrBi2Ta2O9 Thin Films Deposited by RF Magnetron Sputtering"
Integrated Ferroelectrics, Vol. 18, (1997) 377-387.
23
Woong-Chul Shin and Soon-Gil Yoon
"Characterization of RuO2 thin films by Hot-Wall Metal-Organic Chemical Vapor Deposition"
J. of Electrochem. Society, 144(3), (1997) 1055-1060.
24
Nam-Kyeong Kim, Soon-Gil Yoon, Won-Jae Lee, and Ho-Gi Kim
"Electricial and Structural Properties of SrTiO3 Thin Films deposited by Plasma -Enhanced Metalorganic Chemical Vapor Deposition"
J. Materials Research, 12(4), (1997) 1160-1164.
25
Nak-Jin Seong and Soon-Gil Yoon
"Characterization of SrBi2Ta2O9 Ferroelectric Thin Films Deposited at Low Temperatures by Plasma-Enhanced Metalorganic Chemical Vapor Deposition"
Appl. Phys. Lett. 71(1) (1997) 81-83
26
Sank-Shik Park, Cheol-Hoon Yang, Soon-Gil Yoon, Jun-Hyung Ahn, and Ho-Gi Kim
"Characterization of Ferroelectric SrBi2Ta2O9 Thin Films Deposited by a Radio Frequency Magnetron Sputtering Technique"
J. of Electrochemical Society, 144(8) (1997) 2855-2858.
27
Ju-Hong Kwon and Soon-Gil Yoon
"Characterization of Pt thin films deposited by metalorganic chemical vapor deposition for ferroelectric bottom electrodes"
J. of Electrochemical Society, 144(8) (1997) 2848-2854.
28
Ju-Hong Kwon and Soon-Gil Yoon
"Preparation of Pt thin films deposited by metalorganic chemical vapor deposition for ferroelectric thin films"
Thin Solid Films 303 (1997) 136-142.